KG Powder ALD for Mass Production

Yunmao Product Overview

The KG series powder ALD is primarily used for high-precision thin-film deposition of various powder materials. This system can deposit coating films ranging from atomic layer to nanoscale thickness on micron-sized powder surfaces, featuring ultra-high sensitivity, uniformity and repeatability.

Yunmao Technical Advantages

Uniformity < 3%

Maximum sample capacity: 100kg

Vertical dispersion, optimized gas flow

Patented rotary vacuum seal maintains stability

Sample reaction temperature range: RT-300°C

Maximum precursor heating temperature: RT-200°C

Multi-valve system guarantees optimal precursor delivery

Precursors: Supports up to 2 reactive gases and 5 liquid/solid precursor sources

Products category

For Industry

ALD

Plasma Batch ALD

PBATCH Batch PEALD

Thermal Batch ALD

CBATCH 100s Batch Thermal ALD CBATCH 300s Batch Thermal ALD

CVD

MPCVD Diamond CVD

Epitaxy

SICE-Y8 SiC Epitaxy CVD System

Powder ALD/CVD

KG Powder ALD for Mass Production

SCA Powder CVD for Mass Production

For R&D

ALD

Single Wafer ALD

QBT-A
High Vacuum Plasma-enhanced ALD System MINI R&D Desktop ALD

Sputter

Single-Cathode Vertical Sputtering

QBT-P
Dual-chamber Ultra-high Vacuum Magnetron Sputtering System PVD-100
Dual-chamber High Vacuum Magnetron Sputtering System QBT-P L3
Triple-chamber Ultra-high Vacuum Magnetron Sputtering System(α-Ta、Nb-Ta)

Multi-Cathode Vertical Sputtering

QBT-MPV
Multi-target Ultra-high Vacuum Magnetron Vertical Sputtering System

Multi-Cathode Co-Sputtering

QBT-MPC
Multi-target Ultra-high Vacuum Magnetron Co-Sputtering System

MP L Customized Series

QBT-MP·L3
Multi-chamber Ultra-high Vacuum Magnetron Sputtering System

Evaporator

QBT-I Dual-chamber High-speed Evaporator

QBT-J Four-chamber Ultra-high Vacuum GLAD System

QBT-E Dual-chamber Ultra-high Vacuum Electron Beam Evaporator

Powder ALD

GM R&D Powder ALD

QBT-T Dual-chamber Plasma-enhanced Wafer and Powder ALD System

Application

Lithium-ion Battery

Catalysts, Quantum Dots,Metal and Ceramic Powders, Nanomaterials, Drugs

FAQ

What types of thin films can the KG system primarily deposit?

Oxides：Al2O3、ZnO2、HfO2、TiO2、SiO2、SnO2 etc.；Phosphates & Lithium Compounds：TiPO4、AlPO4、LiNbO3、LixTiyOz, etc.；Metals: Cu、Pt、W thin films, etc.

What is the maximum powder processing capacity of the GM series?

The processing capabilities of KG10, KG20, KG40, KG1000 are 10kg, 20kg, 40kg and 100kg respectively. All of them have been shipped in bulk.

What are applications of KG?

1.Battery Applications:Enhances battery performance by optimizing electrode materials;Improves cycling stability and energy density; 2.Catalysis Applications: Enables synthesis of high-efficiency catalysts; Tailors active site distribution and surface reactivity; 3.Metal Powder Processing:Improves powder flowability and handling;Enhances moisture/oxidation resistance; Optimizes sintering interface bonding; 4.Advanced Materials Development:Nanomaterial surface functionalization; Fabrication of novel thin-film architectures 5. Pharmaceutical Applications: Modifies powder characteristics for better compressibility; Enables controlled drug release profiles

Related products

GM R&D Powder ALD

The GM system enables uniform and precisely controlled ALD or MLD on micro-nano powders, featuring patented powder containers, dynamic powder fluidization mechanisms, fully automated temperature control, ALD precursor cylinders, automatic temperature control valves, and industrial-grade safety systems.

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QBT-P Dual-chamber Ultra-high Vacuum Magnetron Sputtering System

QBT-MP·L3 Multi-chamber Ultra-high Vacuum Magnetron Sputtering System

CBATCH 100s Batch Thermal ALD

GM R&D Powder ALD

PVD-100 Dual-chamber High Vacuum Magnetron Sputtering System

QBT-P L3 Triple-chamber Ultra-high Vacuum Magnetron Sputtering System(α-Ta、Nb-Ta)

QBT-MPV Multi-target Ultra-high Vacuum Magnetron Vertical Sputtering System

QBT-MPC Multi-target Ultra-high Vacuum Magnetron Co-Sputtering System

QBT-I Dual-chamber High-speed Evaporator

KG Powder ALD for Mass Production

SCA Powder CVD for Mass Production

QBT-A High Vacuum Plasma-enhanced ALD System

QBT-J Four-chamber Ultra-high Vacuum GLAD System

QBT-E Dual-chamber Ultra-high Vacuum Electron Beam Evaporator

PBATCH Batch PEALD

SICE-Y8 SiC Epitaxy CVD System

QBT-T Dual-chamber Plasma-enhanced Wafer and Powder ALD System

MINI R&D Desktop ALD

CBATCH 300s Batch Thermal ALD

MPCVD Diamond CVD

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