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For Industry

ALD

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Plasma Batch ALD

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PBATCH Batch PEALD

Thermal Batch ALD

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CBATCH 100s Batch Thermal ALD CBATCH 300s Batch Thermal ALD

CVD

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MPCVD Diamond CVD

Epitaxy

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SICE-Y8 SiC Epitaxy CVD System

Powder ALD/CVD

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KG Powder ALD for Mass Production

SCA Powder CVD for Mass Production

For R&D

ALD

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Single Wafer ALD

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QBT-A
High Vacuum Plasma-enhanced ALD System MINI R&D Desktop ALD

Sputter

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Single-Cathode Vertical Sputtering

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QBT-P
Dual-chamber Ultra-high Vacuum Magnetron Sputtering System PVD-100
Dual-chamber High Vacuum Magnetron Sputtering System QBT-P L3
Triple-chamber Ultra-high Vacuum Magnetron Sputtering System(α-Ta、Nb-Ta)

Multi-Cathode Vertical Sputtering

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QBT-MPV
Multi-target Ultra-high Vacuum Magnetron Vertical Sputtering System

Multi-Cathode Co-Sputtering

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QBT-MPC
Multi-target Ultra-high Vacuum Magnetron Co-Sputtering System

MP L Customized Series

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QBT-MP·L3
Multi-chamber Ultra-high Vacuum Magnetron Sputtering System

Evaporator

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QBT-I Dual-chamber High-speed Evaporator

QBT-J Four-chamber Ultra-high Vacuum GLAD System

QBT-E Dual-chamber Ultra-high Vacuum Electron Beam Evaporator

Powder ALD

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GM R&D Powder ALD

QBT-T Dual-chamber Plasma-enhanced Wafer and Powder ALD System

MP L Customized Series Related products

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QBT-MP·L3 Multi-chamber Ultra-high Vacuum Magnetron Sputtering System

Fabrication of superconducting Ta/TiN/NbN/Al/Nb
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