QBT-I Dual-chamber High-speed Evaporator

QBT-I system is a compact system for indium high speed evaporation. Since indium has a relatively low melting point and requires low-temperature deposition, this system is equipped with a cryogenic cooling function that can lower the sample temperature to -70°C, ensuring a smooth indium bump surface. Additionally, it features a rapid quartz crystal microbalance (QCM) replacement module, enabling continuous indium deposition. This system provides an effective solution for flip-chip process and 3D chip chip techniques.

QBT-J compact - Compact dual-chamber dual-angle ultra-high vacuum coating system

Compared with the four-chamber QBT-J, the core advantage of the QBT-J compact lies in its complete equipment functions and highly compact design, which can effectively save cleanroom floor space, enhance the overall operational reliability of the machine, optimize the process flow, and significantly improve efficiency and production capacity. The pre-treatment chamber is equipped with functions such as sample loading, ion beam etching, and oxidation. Compared with competing products, the entire machine adopts an ultra-high vacuum design, which can better ensure the processing of precision devices with strict requirements for interface ultra-high purity and reproducibility, such as superconducting quantum chip Josephson junctions.

QBT-J Four-chamber Ultra-high Vacuum GLAD System

The system employs linear cascade technology, integrating four chambers for load-lock (pre-treatment) chamber, ion milling chamber, evaporator, oxidation chamber. The fully automated system features simple operation and easy maintenance, utilizing a pick-and-place transfer mechanism to minimize particulate generation. With QBT-J, customers can develop high-quality superconducting devices with broad application prospects across multiple fields.

QBT-E Dual-chamber Ultra-high Vacuum Electron Beam Evaporator

QBT-E system is a type of standard evaporation system with two process chambers: load-lock (pre-treatment) chamber and evaporator. UHV background enables high quality film deposition: metal, dielectric materials, optical films, magnetic films and so on. Sample manipulation includes tilting and rotation, or Z-stroke and rotation, enabling planetary or 3D structures.