APPLICATION AREA
yunmao
Advanced Optics
Yunmao's independently developed batch ALD and PEALD systems are designed for cutting-edge applications including Mini/Micro LED, advanced optics, and AR/VR. These systems achieve nanoscale thin-film deposition control while maintaining high-volume production capabilities, providing key technological support to overcome industry bottlenecks in both throughput and product performance. Taking the flagship batch plasma ALD system as an example, its proprietary multi-chamber synchronous deposition technology enables uniform film deposition with <1% thickness variation on complex substrates.
Related products
PBATCH Batch PEALD
PBATCH realises low temperature, high quality plasma-enhanced ALD processes for high-quality thin film deposition (e.g., SiO₂, Al₂O₃, TiO₂) on various substrates, including glass, organic materials, polymers, metals, and ceramics. This system delivers exceptional coating uniformity, repeatability, and reliability while achieving industry-leading throughput and yield rates
CBATCH 300s Batch Thermal ALD
CBATCH 300s enables fully automated, high-throughput continuous production, significantly improving throughput and reducing COO (cost of ownership). The system delivers atomic-level precision control, producing pinhole-free, high-quality thin films suitable for high-κ dielectric layers, metal gate deposition, encapsulation coatings, electroplating seed layers, which are widely used in Mini/Micro LED, third-generation semiconductors, and integrated circuit manufacturing.
CBATCH 100s Batch Thermal ALD
CBATCH 100s is an atomic layer deposition (ALD) system designed for 4/6-inch LED production lines and oxide layer encapsulation coating on micro/nano-devices fabricated on patterned and planar sapphire substrates.
