YUNMAO

Related products

Products category

For Industry

ALD

Plasma Batch ALD

PBATCH Batch PEALD

Thermal Batch ALD

CBATCH 100s Batch Thermal ALD CBATCH 300s Batch Thermal ALD

CVD

MPCVD Diamond CVD

Epitaxy

SICE-Y8 SiC Epitaxy CVD System

Powder ALD/CVD

KG Powder ALD for Mass Production

SCA Powder CVD for Mass Production

For R&D

ALD

Single Wafer ALD

QBT-A
High Vacuum Plasma-enhanced ALD System MINI R&D Desktop ALD

Sputter

Single-Cathode Vertical Sputtering

QBT-P
Dual-chamber Ultra-high Vacuum Magnetron Sputtering System PVD-100
Dual-chamber High Vacuum Magnetron Sputtering System QBT-P L3
Triple-chamber Ultra-high Vacuum Magnetron Sputtering System(α-Ta、Nb-Ta)

Multi-Cathode Vertical Sputtering

QBT-MPV
Multi-target Ultra-high Vacuum Magnetron Vertical Sputtering System

Multi-Cathode Co-Sputtering

QBT-MPC
Multi-target Ultra-high Vacuum Magnetron Co-Sputtering System

MP L Customized Series

QBT-MP·L3
Multi-chamber Ultra-high Vacuum Magnetron Sputtering System

Evaporator

QBT-I Dual-chamber High-speed Evaporator

QBT-J Four-chamber Ultra-high Vacuum GLAD System

QBT-E Dual-chamber Ultra-high Vacuum Electron Beam Evaporator

Powder ALD

GM R&D Powder ALD

QBT-T Dual-chamber Plasma-enhanced Wafer and Powder ALD System

ALD Related products

Single Wafer ALD

QBT-A High Vacuum Plasma-enhanced ALD System

QBT-A High Vacuum Plasma Enhanced Atomic Layer Deposition System by Yunmao Technology is the first HV-PEALD equipment suitable for high-end R&D and manufacturing in China. It is primarily used for depositing high-quality ALD thin films (oxides, nitrides, metallic elements). Its high-vacuum design reduces system leakage rates and features an oxygen-free ceramic plasma generator, gas passivator, and four dual-tube source bottles. It enables ultra-low RF circuit loss, high-aspect-ratio TSV filling, and ultra-low oxygen content.

MINI R&D Desktop ALD

MINI is a mini easy-to-use desktop ALD system, which can realize controllable atomic layer deposition on 4-inch wafers and micro and nanopowders in high uniformity. It is the the best solution to research and application of advanced energy materials and new nanomaterials.